| Private joint-stock company "Development and Manufacturing company "Ferrite-Quasar" has many years of fruitful experience in the manufacture of photomasks for the production of microelectronics, electronics, optics and other applications. |
| At your service: |
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• Preparation and coding of topological information in the required format, taking into account the technological features of the use of photomasks. |
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• Production and printing of standard working photomasks, as one-time, and long-term (serial, planned) work. |
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• Wide range of types and sizes of photomasks: |
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- emulsion (High-resolution glass and film); |
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- plate run (iron and chromium); |
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- with sizes of glasses 76x76, 102x102, 127x127, 153x153 mm. |
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• High precision photomasks:
- minimum size of elements of topology - 1 micrometer;
- accuracy of the elements of the topology of ± 0.2 micrometer;
- overlay accuracy photomask complete - 0.5 micrometer.
Note. Working field multiplier is limited to 80 mm in diameter on the plates 102x102 mm. |
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• Guaranteed quality, compliance with minimum terms of the treaty, the protocol design of control measurements. |
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| As the input information can be used a sketch or drawing of the Customer, the table of coordinates, formulas, graphics editor, paste in Word, scanned images, as well as graphic files AutoCAD, PCAD, Corel Draw. |
Lumped Element Isolators & Circulators
